設備概要

  大型液晶パネル製造工程用現像液再生システム

  TMAH濃度、Photo Resist濃度、炭酸塩濃度の管理及び安定的なCD値

  高い再生率で大幅なコストダウンができる

精度保証

  TMAH 濃度 : 2.380 ± 0.005wt% 

Features

• Control of the true developer concentration that does not include carbonate and photo-resist, carbonate concentration in Developer

• Real-time monitoring of Developer components by multi-components concentration meter

• Reducing total volume of Developer waste

• Reducing consumption of TMAH and De-Ionized Water for TMAH dilution